SENTECH Gesellschaft für Sensortechnik mbH

W3 Fair+Convention 2020

Booth B22

SENTECH offers plasma process technology and thin-film measurement systems successfully for many years. We focus especially on the quality, flexibility and automation capability of the systems. Applications are the production and measurement of thin films and the etching of micro- and nanostructures. Users can be found in the semiconductor industry, optics, MEMS, telecommunications, sensor technology and many other areas. SENTECH offers the following technologies: Reactive ion etching, plasma enhanced chemical vapor deposition, atomic layer deposition, ellipsometry and reflectometry

SENTECH sells equipment for plasma process technology (etching/coating equipment, ALD, ALE) and measuring equipment for optical thin film metrology (ellipsometers and reflectometers)

Products

Plasma Process Technology:
ICP etching system for low damage etching, RIE etching system, ICPECVD system for low damage coating, ALD and ALE systems. All equipment can be integrated into one cluster.

Optical thin film metrology:
SENresearch 4.0 with wide spectral range from 190 - 3,500 nm, SENDIRA MIR spectroscopic ellipsometer, SENDURO MEMS an automated measurement platform, laser ellipsometer and others.

General Information

SENTECH Gesellschaft für Sensortechnik mbH
IVAM member
Konrad-Zuse-Bogen 13
82152 Krailling
Germany
Founding Year: 1987

Contact

Dr. Helmut Witek
+49 89 897 9607-0

Latest news

SENTECH SIPAR: Combining PEALD and PECVD in one Reactor
23.04.2018 SENTECHs new developed SIPAR allows combining PECVD and ALD in one reactor. With that a higher throughput and the combination …